Yayın: Sıcak Filaman Kimyasal Buhar Biriktirme Yöntemi İle Tac Üretimi Ve Karakterizasyonu
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Danışman
Bölüm / Program
Malzeme Bilimi ve Mühendisliği
Material Science and Engineering
Material Science and Engineering
Dergi Başlığı
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Yayıncı
Fen Bilimleri Enstitüsü
Institute of Science and Technology
Institute of Science and Technology
Türü
Özet
Bu çalışmanın amacı SFKBB yöntemi kullanarak Tantal Karbür (TaC) kaplamalar üretebilmektir. Deneylerde Si (111) altlık kullanılmıştır. Kaplamalarda kullanılan altlıklar, hem üzerlerindeki oksit varlığında hem de asit dağlama ile oksidin giderilmiş olduğu durumda kullanılmıştır. Ta-C kaplama üretimi için kullanılan diğer yöntemlerden farklı olarak SFKBB haznesindeki Ta filaman; hidrojen ve metan varlığında, farklı sıcaklık ve toplam basınç değerlerinde buharlaştırılmıştır. Kaplamalar sırasında elmas oluşturmaya izin vermeyecek H2/CH4 oranları kullanılmaya özen gösterilmiştir. Kaplamalar, XRD, Raman Spektroskopisi, optik profilometre, mikro sertlik ve SEM kullanılarak incelenmiştir. Yapılan deneyler sonucunda 200-600 nm arasındaki kalınlıklarda, değişik oranlarda karbon içeren TaC yapısında kaplamalar elde edilebileceği ilk defa bu çalışma kapsamında ortaya konulmuştur.
The aim of this study is to produce tantalum carbide (TaC) coatings by using HFCVD method. Si (111) substrate is used in the study. Substrates that are used in coatings are both used, while they contain oxide and after oxide is removed by acide etching. As distinct from other methods which are used to produce TaC coatings, Ta filament in HFCVD chamber is vaporized in the presence of hydrogen and methane, in different temperature and total pressure values. Proper H2/CH4 proportions to avoid diamond generations are elaborately used over the course of coatings. Coatings are examined by using XRD, Raman Spectroscopy, optic profilometry, micro hardness and SEM. Within the scope of this experiment, it is shown that TaC structured for the first time. The coatings which contain different amounts of carbon, in 200-600 nm thickness, might be produced. It is observed that temperature and pressure have influence on film thickness and increasing methane concantration has influence on thickness and glassy carbon formation. Surface roughness and hardness of treated samples with acid take lower values than not treated samples. An increase in crystallite size is observed in conditions of high methane concentration and temperature. Morphologically, significant columnar grain structure is found in high proportions of pressure and methane.
The aim of this study is to produce tantalum carbide (TaC) coatings by using HFCVD method. Si (111) substrate is used in the study. Substrates that are used in coatings are both used, while they contain oxide and after oxide is removed by acide etching. As distinct from other methods which are used to produce TaC coatings, Ta filament in HFCVD chamber is vaporized in the presence of hydrogen and methane, in different temperature and total pressure values. Proper H2/CH4 proportions to avoid diamond generations are elaborately used over the course of coatings. Coatings are examined by using XRD, Raman Spectroscopy, optic profilometry, micro hardness and SEM. Within the scope of this experiment, it is shown that TaC structured for the first time. The coatings which contain different amounts of carbon, in 200-600 nm thickness, might be produced. It is observed that temperature and pressure have influence on film thickness and increasing methane concantration has influence on thickness and glassy carbon formation. Surface roughness and hardness of treated samples with acid take lower values than not treated samples. An increase in crystallite size is observed in conditions of high methane concentration and temperature. Morphologically, significant columnar grain structure is found in high proportions of pressure and methane.
Tanım
Tez (Yüksek Lisans) -- İstanbul Teknik Üniversitesi, Fen Bilimleri Enstitüsü, 2011
Thesis (M.Sc.) -- İstanbul Technical University, Institute of Science and Technology, 2011
Thesis (M.Sc.) -- İstanbul Technical University, Institute of Science and Technology, 2011
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İTÜ theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission.
Anahtar Kelimeler
ince film kaplama, kimyasal buhar biriktirme, TaC, thin film coating, chemical vapour depostion, TaC
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