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Design considerations for CMOS digital circuits with improved hot-carrier reliability

dc.contributor.authorLeblebici, Yusuf
dc.date.accessioned2026-01-25T03:32:55Z
dc.date.issued1996-07-01
dc.description.abstractThe hot-carrier induced degradation of the transient circuit performance in CMOS digital circuit structures is investigated and modeled. Delay-time degradation as a result of transistor aging, as opposed to current degradation, is devised as a more realistic measure of long-term circuit reliability. It is shown that for a wide class of circuits, the performance degradation due to dynamic hot-carrier effects can be expressed as a function of the nMOS and pMOS transistor channel widths, and the output load capacitance. In addition, the influence of the parasitic gate-drain overlap capacitance and the resulting drain voltage overshoot upon aging characteristics is investigated. The degradation of tapered (scaled) inverter chains is modeled, and a simple design guideline based on the scaling factor (F) and the transistor aspect ratio (/spl tau/) is presented for the improvement of long-term reliability in scaled buffer structures with respect to hot-carrier induced device aging. Also, a number of simple design rules based on device geometry, circuit topology and power supply voltage are presented to ensure hot-carrier reliability.
dc.description.urihttps://doi.org/10.1109/4.508215
dc.description.urihttps://dx.doi.org/10.1109/4.508215
dc.identifier.doi10.1109/4.508215
dc.identifier.endpage1024
dc.identifier.issn0018-9200
dc.identifier.openairedoi_dedup___::569d5340df0215884807c04893354809
dc.identifier.startpage1014
dc.identifier.urihttps://hdl.handle.net/11527/44010
dc.identifier.volume31
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)
dc.relation.ispartofIEEE Journal of Solid-State Circuits
dc.rightsCLOSED
dc.titleDesign considerations for CMOS digital circuits with improved hot-carrier reliability
dc.typeArticle
dspace.entity.typePublication

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