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Dynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System

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dc.contributor.authorYakup, Hundur
dc.contributor.authorGüvenç, Ziya B.
dc.contributor.authorRainer, Hippler
dc.date.accessioned2026-01-24T13:18:24Z
dc.date.issued2008-02-01
dc.description.abstractThe sputtering process of Ar+Ni(100) collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni(100) slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL potential. Ni atom emission from the lattice is analysed over the range of 20–50 eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical and experimental data.
dc.description.urihttps://doi.org/10.1088/0256-307x/25/2/102
dc.description.urihttps://dx.doi.org/10.1088/0256-307x/25/2/102
dc.identifier.doi10.1088/0256-307x/25/2/102
dc.identifier.eissn1741-3540
dc.identifier.endpage733
dc.identifier.issn0256-307X
dc.identifier.openairedoi_dedup___::010d459a77f492080a35c7c7d28e81af
dc.identifier.startpage730
dc.identifier.urihttps://hdl.handle.net/11527/32805
dc.identifier.volume25
dc.publisherIOP Publishing
dc.relation.ispartofChinese Physics Letters
dc.sdg.typeGoal 7: Affordable and Clean Energy
dc.titleDynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System
dc.typeArticle
dspace.entity.typePublication

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